![Aluminium Sputter Targets [Al] Purity:100.00% 00” (DN200CF) Half Nipple](https://cdn.shopify.com/s/files/1/0117/2714/2969/products/SP-AL-1-4-4N.jpg?v=1651812937)
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00” (DN200CF) Half Nipple
Propylene Glycol Electrical attributes (24Vdc
38” (DN50CF) Half Nipple
Interlock restored
Plasma temperature: < 50 °C
Aluminium Sputter Targets [Al] Purity:100.00% 00” (DN200CF) Half NippleAluminium Sputter Target used for Magnetron Sputtering Physical Vapour Deposition. Various diameters, thicknesses and purities available to suit all major sputter source manufacturers. If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation. All our materials are tested using ICP OES chemical analysis and manufactured under ISO9001: 2008 certification. Materials are vacuum packed under cleanroom
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